Document Type: Research Paper
Molybdenum oxide (α-MoO)thin films were prepared on quartz and silicon substrates by thermal oxidation of Mo thin films deposited using DC magnetron sputtering method.
The influence of thermal oxidation times ranging from 60-240 min on the structural and morphological properties
of the preparedfilms was investigated using X-ray diffraction, Atomic force microscopy and Fourier transform infrared
spectroscopy. The XRD results revealed that the as deposited film was amorphous while those formed at thermal
oxidation times between 60-180 min exhibited polycrystalline orthorhombic molybdenum oxides.
The presence of (0k0) reflections in XRD patterns indicated the layered structure of α-MoO. Also the surface morphology
of the films isdependent on the thermal oxidation times. The FTIR spectrum confirmed the formation of MoO3 and the
peak at 992.53 cm-1 implythelayered structure of α-MoO3.